ETEL, part of HEIDENHAIN and a supplier of high-performance motion-control components and complete motion platforms, has introduced the METIS HP, a full air-bearing planar platform aimed at demanding step-and-scan semiconductor applications. The company lists direct laser writing and high-resolution optical inspection systems among the target uses. ETEL describes the launch as strengthening its position in high-precision motion control by combining exceptional speed and stability, outstanding dynamic straightness and projected tool-point measurement capability.
The platform is a new addition to ETEL's motion-platform offering. The announcement focuses on the combination of a planar air-bearing stage, encoder-based measurement and controller functions. According to ETEL, these elements are intended to support accurate motion at high scanning velocities.
Encoder architecture and triggering
At the core of the METIS HP is a multi-degree-of-freedom HEIDENHAIN encoder, which ETEL says ensures accuracy without thermal drift. This architecture enables projected tool-point measurement. ETEL controllers can emulate a transistor-transistor logic position signal for use as a trigger event. The TTL signal is intended to mark a trigger event within the motion system, and the removal of the carriage mirror is presented as a simplification of the machine architecture.
The company presents this approach as a compelling alternative to the classical interferometer used as an advanced trigger generator. According to ETEL, the METIS HP does not require a mirror to be added on the carriage, avoids air lensing effects and air perturbation, and carries a lower cost. These points are company claims about the architecture rather than independently verified comparisons.
Specified performance
ETEL specifies ±150 nm accuracy over the full XY stroke after mapping, ±150 nm dynamic straightness at speeds up to 1 m/s, and dynamic capabilities reaching accelerations up to 20 m/s². The accuracy figure is stated for mapped operation across the full XY stroke. The company says these capabilities minimize turnaround time and thereby increase machine throughput for step-and-scan applications.
Inspection and large-panel lithography
For high-end inspection in advanced packaging, ETEL says rapid and precise focal-distance adjustments are required. The METIS HP includes a high-bandwidth 4-DoF module for fine control of the Z, tip, tilt and theta axes. The company describes the platform as optimal for these demanding inspection tasks.
Stéphane Pellegrini, product manager at ETEL, said the METIS HP builds on the company's long-standing expertise in high-precision platforms and provides the trajectory quality required for advanced optical processes. He said its speed stability and dynamic straightness are intended to ensure consistent performance at high scanning velocities.
The platform supports panel sizes up to 600 mm × 600 mm. ETEL says this addresses the growing need for next-generation maskless lithography with large-area substrates.